You should not use M3 or M2-M3 contacts.
Load and source should be comparable to input capacitance and output resistance of DUT cell.
Make versions of your cell: Duplicate with name and version number.
Transistor size in schematic and layout should match.
Tools-NCC-Schematic and layout
File-Preferences-Tools-NCC-Check transistor sizes
Select metal2 and the draw a line in M2.
Exports should be in M1-M2 contact.
Measurements statements can be included in the LTSPICE file and results are written in a log file.
Placing a contact does not yet make connection. You have to do it afterwards by connecting lines.
Overview
Review:
Memory: Type, Array, Realization, Trends
SRAM, DRAM, Flash
Today:
Power
Clock
Package: Physical design, parasitics, heat, power
IO Pads (Input and Output): Level, noise, ESD
Microelectronics story
How to build complex systems and plan progress
Bottom up, characterize (simulate), reuse, simple solution, no optimization
Rules help to keep it simple: Design rules, standard cells, rules for yield
Make automation easy
Silicon compiler, VHDL helps to assemble complex circuits automatically
High level design VHDL, high level simulation IRSIM.
Top level: SystemC, Matlab/Simulink, Labview (not yet in this class)
Circuits and Test: Inverter, AND, OR, AOI, TG, Flip-Flop
Microcontroller (datapath, ALU, random logic) comparator, adder, multiplier, shift
Reuse of IP: read, understand, verify with simulation
Test for reuse and yield
Memory array, data flow
Timing closure
Power, clock, IO
Chip assembly
Test for yield and diagnostic
Power
Instantaneous power
P = v(t) · i(t)
Average power
Pavg = Average(v(t) · i(t)) = Vrms,DD Irms,avg
Standby: Diode leakage, transistor off current
Active:
Charge and discharge of capacitance
Cross current at switch point: NFET and PFET simultaneously on
Analog bias currents
\( C = \frac{Q}{V} = \frac{I \cdot t }{V} \)
\( I = \frac{C \cdot V}{t} = C \cdot V_{DD} \cdot f_{CLK} \)
\( P_{act} = C \cdot V_{DD}^2 \cdot f_{CLK} \)
Power discussion
High clock frequency has maximum power
Clock frequency of small devices is limited by allowed power density
Supply voltage
Lower voltage gives lower power: P∝ V2
higher RDSon, higher tPD, lower fCLK
Performance of a semiconductor process can be measured using a ring oscillator.
The ring oscillator connects the output of an odd series of inverters with the input
creating an unstable feedback.
The oscillator frequency is limited by the propagation delay of the inverters.
This measures the RDSon, Cin and ft.
DRAM IDD Specification
Micron 256Mb DRAM -5B, VDD = 2.6 V, MT46V32M8
Operating one-bank precharge current
IDD0= 75 mA
Operating one-bank active-read-precharge current
IDD1= 85 mA
Precharge power-down standby current
IDD2P= 4 mA
Idle standby current
IDD2P= 23 mA
Auto refresh burst current
IDD5= 115 mA
Operating bank interleaved read current
IDD7= 175 mA
There is a great variation in current. Receiver and driver circuits can be turned on and off.
The voltage has to be stable for all conditions.
Dynamic power peaks and currents
Standby
Active:
Read, write, compute
Power on, power off
DRAM dynamic read current
Ring oscillator power buffering with bypass capacitors
Simulation:
A ring oscillator shows the performance of a given semiconductor technology.
A 50 nm simulation shows a frequency of 500 MHz.
Series resistance in the power lines limits the voltage swing between 80 mV and 900 mV.
Average current is 93 mA.
The voltage level of gnd and vdd shows a ringing due to changing IDD.
Bypass capacitors can reduce the swing on the power lines, given more stable operation.
Not used area on chip can be filled with capacitance.
Real bypass capacitors
Frequency response of power capacitances:
A real capacitance has a parasitic resistance and inductance.
There is a limited bandwidth for supply voltage stabilization.
A combination of many capacitances with optimized resistance and inductance is needed.
Power grid: DRAM example
There are separate power supply pins for the data input and outputs (IO).
The number of power pins is proportional to the number of IOs.
There are separate grids for digital and analog circuits.
Horizontal and vertical lines are connected to a grid and provide power.
The block diagram shows different voltages in different colors in different areas.
Voltage pumps and regulators are shown in grey.
A bandgap reference circuit provides temperature and voltage independent voltages.
Power on sequence: DRAM
DRAM internal voltages and power on sequence.
A low array voltage is used to save power.
A negative back bias is needed reducing memory cell leakage current.
A high voltage Vpp gives the select transistor overdrive to store the full Vblh level in the memory cell.
Vint is optimized for speed and to be able to drive the IOs.
A high current peak, when power is turned on, has to be avoided.
All capacitances will be charged up at power up.
Power system model
Power management and power supply
Printed circuit board (PCB)
Package
Chip
Memory chip package
This is a TSOP5 package used around 2005 for DRAM memories.
Nowadays memories use bga packages.
The package is smaller and has better high speed performance.
It is more expensive than a TSOP package.
Test and failure analysis is more difficult.
Clock: single ended, differential, non overlapping (TBD)
Clock skew and jitter (TBD)
DLL and PLL (TBD)
Clock tree and clock domains
CLK Distribution: H-Tree and clock domains
H Tree
System on chip
Microprocessors have one central clock distributed via a balanced or unbalanced H-tree.
Systems on chip have many blocks with local clocks.
Communication is done via serial bus between clock domains.
Divide and conquer.
Power and clock Example
Dynamic random access memory (DRAM)
DLL for clock recovery for data alignment
Multiple internal voltages: Vpp, VBB, Vint, Vblh
Power up sequence
Microprocessor (µP)
Single clock tree
Field programmable gate array (FPGA)
Multiple clock synthesis circuits (PLL, DLL)
System on chip (SoC)
Multiple blocks with separate clocks (clock domains),
communicating via serial links
Data converters
Mixed signal design with low jitter clock
Package and Pads
The package limits chip size, maximum heat, frequency (parasitics), price, number of pins,
input capacitance and inductance.
Matching of measurement and simulation makes sure all parasitics are understood.
Package development and qualification is part of chip development
Package filler material can damage the chip
Package prevents chip damage via moisture or physical strain.
Power distribution, voltage drop, buffer capacitances and noise.
Pads: power, input, output
Pad circuits are supplied by the manufacturing facility in the design manual.
Pad simulations have to be done at the 3-D device simulation level and are not very accurate.
Dual in line (DIL)
Thin small outline (TSOP)
Ball grid array (BGA)
Package parasitics
Bond wires
Gold bond wires connect the chip pads with metal lead frame.
Thermal coupling is also achieved with bond wires and lead frame.
Electric libraries: muddpads13_ami05.jelib pads4u.jelib
Electric: Tools -> Generation -> Pad frame generator
A configuration file (*.arr) allows automatic pad generation.
Wiring can then be done with the Sea of gates route.
In the user manual an example is provided.
This example shows the pad frame not the active area to limit minimum chip size.
Alignment marks and labels for chip identification are missing.
Multiple chips are put on one reticle with a distance of 200 µm for sawing (dicing) to
separate the chips.
Test structures are placed in this space to be able to monitor process performance.